Materials containing听per and poly-fluoroalkyl substances (PFAS)听have become a cornerstone of functionality in semiconductor manufacturing because听of听their unique chemical properties.听In the case of surfactants, PFAS are听vital to enabling surface coat uniformity, complete resist removal with low defectivity, improved听line roughness and reduced line collapse.听This paper presents case studies on听the removal of PFAS-containing surfactants in lithographic materials.听There is no drop-in solution that would fit all surfactant use applications, however, making the replacements of these materials costly and time-consuming. Full replacement of PFAS-containing materials may not be possible for some of the most exacting applications.听听听
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