Photo-acid generatorsÌý(PAGs) are a vital componentÌýof many semiconductor photolithography formulations, especially chemically amplified resists (CARs). The outlook for fullyÌýremovingÌýPFAS-containing materialsÌýfrom PAGs industrywideÌýis much more uncertain.ÌýTo date, no replacement molecules (either commercially available or in a research phase) have been found that could match the performance of existing PFAS PAGs. Even ifÌýit is possible to develop non-PFAS PAGs for all applications, the impact and timeline from subsupplierÌýto supplier to device manufacturerÌýis extensive.Ìý
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